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Effects of substrate and deposition method onto the mirror scattering
Hyun-Ju Cho1, Myung-Jin Shin, Jae-Cheul Lee
1Center of Photonics and Microwave, Institute for Advanced Engineering, Youngin P.O. Box 25, Youngin-Si, Kyunggi-Do, South Korea, 449-860. hjcho@iae.re.kr
Abstract:
The effect of surface roughness onto the mirror scattering has been studied. Five kinds of substrates with different surface roughness were fabricated. On those substrates, dielectric multilayer coating for high reflectivity was deposited by ion-beam sputtering (IBS) and by electron-beam (EB) evaporation. Total integrated scattering (TIS) measurement setup was built for the evaluation of deposited samples. Most of the IBS mirrors showed lower scattering than the EB mirrors, which were deposited on the similar substrates in surface roughness. The ratio of substrate TIS to mirror TIS was defined for evaluation. It increased abruptly at approximately 2A in surface roughness, which indicated that to make low-loss mirrors, the substrate roughness should be less than 2A in rms.
