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Published on: April 17, 2018
Surface-Sensitive XAFS in the Hard X-ray Region with Sub-Monolayer Sensitivity
Journal of Synchrotron Radiation
|March 1, 1995
Summary
This study reports surface-sensitive X-ray absorption fine structure (XAFS) with high sensitivity. The technique precisely measures surface atomic incorporation, like arsenic on InP surfaces.
Area of Science:
- Materials Science
- Surface Science
- Solid-State Physics
Background:
- Surface analysis requires techniques with high sensitivity to probe atomic-level structures.
- X-ray absorption fine structure (XAFS) is a powerful tool for elemental and structural analysis.
- Existing XAFS methods often lack the necessary sensitivity for sub-monolayer surface studies.
Purpose of the Study:
- To develop and demonstrate a highly surface-sensitive X-ray absorption fine structure (XAFS) technique.
- To enhance fluorescence detection efficiency for improved XAFS measurements.
- To apply the technique for structural characterization of surfaces and buried interfaces.
Main Methods:
- Utilized grazing-incidence fluorescence detection for surface sensitivity.
- Combined a multipole wiggler with a multi-element Si(Li) solid-state detector to boost fluorescence detection efficiency.
- Performed As K-edge XAFS studies on an InP(001) surface exposed to AsH(3).
Main Results:
- Achieved sub-monolayer sensitivity in surface XAFS measurements.
- Increased fluorescence detection efficiency by over two orders of magnitude.
- Demonstrated the incorporation of approximately 0.1 monolayer of As atoms into the InP(001) surface, substituting P atoms.
Conclusions:
- The developed grazing-incidence fluorescence XAFS technique offers exceptional surface sensitivity.
- This method is effective for structural studies of surfaces and interfaces in the hard X-ray region.
- The findings provide crucial insights into surface atomic substitution processes.
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