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Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Local lattice parameter determination of a silicon (001) layer grown on a sapphire (1102) substrate using
Takayuki Akaogi1, Kenji Tsuda, Masami Terauchi
1Asahi-Kasei Co. Ltd, 2-1 Samejima Fuji 416-8501, Japan. akaogi.tb@om.asahi-kasei.co.jp <tb@om.asahi-kasei.co.jp>
Abstract:
All the six lattice parameters (a, b, c, alpha, beta and gamma) of a Si (001) layer grown on a sapphire (1102) substrate were determined by convergent-beam electron diffraction with no assumption of crystal lattice symmetry. A lattice compression in the Si (001) plane and an elongation in the [001] direction were revealed. An anisotropic lattice compression in the (001) plane was clearly detected for the first time. That is, the lattice compression in the Si [100] direction, which is parallel to the sapphire [1101] direction, was larger than that of the Si [010] direction, which is parallel to the sapphire [1120] direction. It was also revealed that the lattice parameters of the Si-layer depend on the distance from the interface. Anisotropy of carrier mobility was reasonably explained in terms of the anisotropy of the lattice parameters determined.
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