Related Experiment Video
Updated: Jul 19, 2026

Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene
Published on: July 3, 2015
What controls deposition rate in electron-beam chemical vapor deposition?
William B White1, Konrad Rykaczewski, Andrei G Fedorov
1Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, USA.
Abstract:
The key physical processes governing electron-beam-assisted chemical vapor deposition are analyzed via a combination of theoretical modeling and supporting experiments. The scaling laws that define growth of the nanoscale deposits are developed and verified using carefully designed experiments of carbon deposition from methane onto a silicon substrate. The results suggest that the chamber-scale continuous transport of the precursor gas is the rate controlling process in electron-beam chemical vapor deposition.
Related Concept Videos
Preparation of Samples for Electron Microscopy
Electrodeposition
Electrodeposition can...
Electrogravimetric Analysis: Overview
To test the completeness of the...

