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Nonfluorinated volatile copper(I) 1,3-diketiminates as precursors for Cu metal deposition via atomic layer deposition

Kyung-Ho Park1, Alexander Z Bradley, Jeffery S Thompson

  • 1Central Research and Development, DuPont Company, Experimental Station, Wilmington, Delaware 19880-0328, USA. kyung-ho.park@usa.dupont.com

Inorganic Chemistry
|October 13, 2006
PubMed

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