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Diffractive element design for resonant scanner angular correction: a beam retardation approach.

Jed Khoury1, Bahareh Haji-saeed, Christian P Morath

  • 1Air Force Research Laboratory/SNHC, Hanscom Air Force Base, MA 01737, USA. jed.khoury@hanscom.af.mil

Applied Optics
|October 28, 2006
PubMed
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This study introduces a novel diffractive optical element design for linearizing resonant mirror scanner angular scans. The new method accounts for beam diameter, enhancing robustness against beam fanning.

Area of Science:

  • Optics
  • Optical Engineering
  • Photonics

Background:

  • Resonant mirror scanners often exhibit nonlinear sinusoidal angular scans.
  • Linearizing these scans is crucial for applications requiring precise beam positioning.
  • Existing methods for optical correction have limitations in robustness.

Purpose of the Study:

  • To propose a new diffractive optical corrective element design.
  • To enable conversion of nonlinear sinusoidal scanning into linear scanning.
  • To enhance the robustness of optical correction against beam fanning.

Main Methods:

  • Designing a graded index of refraction device as a reference.
  • Utilizing beam retardation through propagation in an inhomogeneous medium.
  • Employing a binarizing algorithm of accumulated phase for diffractive element design.

Related Experiment Videos

  • Incorporating beam diameter considerations into the design methodology.

    • Main Results:

    • A novel diffractive optical element capable of zooming and linearizing scanning.
    • The new approach demonstrates improved robustness against beam fanning compared to prior methods.
    • The design accounts for beam diameters, leading to more stable performance.

    Conclusions:

    • The proposed diffractive optical element design offers a robust solution for linearizing resonant mirror scanner angular scans.
    • This approach provides a significant improvement over previous methods by considering beam diameter.
    • The developed optical corrective elements are suitable for applications demanding precise beam control.