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Published on: November 30, 2012
Low loss high mesa optical waveguides based on InGaAsP/InP heterostructures
1Department of Information and Communications, Gwangju Institute of Science and Technology, Oryongdong Bukgu Gwangju 500-712, South Korea.
Journal of Nanoscience and Nanotechnology
|January 27, 2007
Summary
Low loss optical waveguides were fabricated using ICP-RIE and electron beam lithography. Sidewall roughness was measured to calculate scattering loss, matching experimental propagation loss measurements.
Area of Science:
- Materials Science
- Optoelectronics
- Nanotechnology
Background:
- Indium Gallium Arsenide Phosphide/Indium Phosphide (InGaAsP/InP) heterostructures are crucial for optoelectronic devices.
- Achieving low propagation loss in optical waveguides is essential for efficient signal transmission.
- Fabrication techniques directly impact waveguide performance, particularly sidewall quality.
Purpose of the Study:
- To fabricate low loss, high mesa optical waveguides on InGaAsP/InP heterostructures.
- To optimize the fabrication process by analyzing etched sidewall roughness.
- To correlate theoretical scattering loss calculations with measured propagation losses.
Main Methods:
- Inductively-Coupled-Plasma Reactive Ion Etching (ICP-RIE) and electron beam lithography for waveguide fabrication.
- Atomic Force Microscopy (AFM) with a carbon nanotube tip for 3D sidewall imaging.
- Modified Fabry-Perot method for measuring waveguide propagation losses.
Main Results:
- Optimized ICP-RIE process resulted in deep-etched waveguides with reduced sidewall roughness.
- Root-mean-square (rms) roughness and correlation length were quantified using AFM data.
- Theoretical scattering loss calculations based on sidewall roughness showed good agreement with measured propagation losses.
Conclusions:
- The study successfully fabricated low loss optical waveguides on InGaAsP/InP.
- Sidewall roughness is a critical parameter influencing scattering loss in optical waveguides.
- The combination of ICP-RIE, e-beam lithography, and AFM provides an effective method for optimizing waveguide fabrication for low loss applications.
