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Updated: Jul 12, 2026

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Double Emulsion Generation Using a Polydimethylsiloxane (PDMS) Co-axial Flow Focus Device
Published on: December 25, 2015
Photodefinable polydimethylsiloxane (PDMS) for rapid lab-on-a-chip prototyping
Ali Asgar S Bhagat1, Preetha Jothimuthu, Ian Papautsky
1Department of Electrical and Computer Engineering, 814 Rhodes Hall, ML030, University of Cincinnati, Cincinnati, OH 45221, USA.
Lab on a Chip
|August 24, 2007
Summary
We developed a simple photopatterning method for polydimethylsiloxane (PDMS) using benzophenone. This novel photoPDMS process enables rapid, low-cost fabrication of microfluidic devices and shadow masks without cleanroom facilities.
Area of Science:
- Materials Science
- Microfluidics
- Photochemistry
Background:
- Polydimethylsiloxane (PDMS) is widely used in microfluidics.
- Existing PDMS patterning methods can be complex and require specialized equipment.
- There is a need for simpler, faster, and more accessible PDMS fabrication techniques.
Purpose of the Study:
- To introduce a new, simple, and direct photopatterning method for PDMS.
- To demonstrate the fabrication of microfluidic devices and shadow masks using this method.
- To optimize the process parameters for reliable feature generation.
Main Methods:
- Utilizing benzophenone as a photoinitiator in a PDMS mixture (photoPDMS).
- Employing UV light (below 365 nm) for photopatterning under ambient light.
- Fabricating microfluidic channels and thin free-standing films with through patterns.
Main Results:
- Successfully patterned PDMS with features around 100 micrometers.
- Fabricated microfluidic channels and characterized them using fluorescence microscopy.
- Created thin, free-standing patterned films used as effective shadow masks.
Conclusions:
- The photoPDMS process offers a fast, simple, and master-free method for PDMS patterning.
- This technique enables the rapid prototyping of low-cost, disposable lab-on-a-chip (LOC) devices.
- The process is suitable for applications outside of cleanroom environments.

