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A flexible curvilinear electromagnetic filter for direct current cathodic arc source.

Hua Dai¹, Yao Shen, Liuhe Li

¹School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.

The Review of Scientific Instruments

|October 2, 2007

Summary

A new flexible electromagnetic filter effectively removes macroparticle contamination from direct current cathodic arc deposition. This innovation significantly improves film quality by reducing macroparticle density, enabling wider industrial applications.

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Area of Science:

Materials Science
Plasma Physics
Surface Engineering

Background:

Direct current (dc) cathodic arc deposition offers high deposition and ionization rates but suffers from macroparticle (MP) contamination.
Macroparticle contamination limits the widespread application of this otherwise advantageous deposition technique.

Purpose of the Study:

To develop and evaluate a flexible curvilinear electromagnetic filter for eliminating macroparticles from dc cathodic arc sources.
To optimize filter parameters for enhanced MP removal efficiency and ion transport.

Main Methods:

Design and implementation of a flexible curvilinear electromagnetic filter with a minor radius of 85 mm.
Utilized a saturated ion current probe to measure filter efficiency.
Analyzed macroparticle density in TiN films deposited with and without the filter, and compared with a 90-degree duct magnetic filter.
Investigated the impact of filter coil potential and cathode surface magnetic field on filter performance.

Main Results:

The flexible filter achieved an MP removal efficiency of approximately 2.0% for an aluminum cathode at 250 A filter current.
MP density in TiN films was reduced by two to three orders of magnitude compared to a 90-degree duct magnetic filter and three to four orders of magnitude compared to no filter.
Filter efficiency was enhanced up to 12-fold with optimized biasing potentials.
A magnetic field of approximately 4.0 mT improved filter efficacy by a factor of 2 compared to 5.4 mT.

Conclusions:

The flexible curvilinear electromagnetic filter effectively mitigates macroparticle contamination in dc cathodic arc deposition.
Optimizing filter coil potential and cathode magnetic field significantly enhances MP removal efficiency.
This technology enables higher quality films, broadening the applicability of cathodic arc deposition.