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Inorganic polymer photoresist for direct ceramic patterning by photolithography
Tuan Anh Pham1, Pilnam Kim, Moonkyoo Kwak
1Department of Fine Chemical Engineering and Chemistry, Chungnam National University, Daejeon 305-764, Korea.
Chemical Communications (Cambridge, England)
|October 4, 2007
Abstract:
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
