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Updated: Jul 10, 2026

Sputter Growth and Characterization of Metamagnetic B2-ordered FeRh Epilayers
Published on: October 5, 2013
Rhodium coated mirrors deposited by magnetron sputtering for fusion applications
L Marot1, G De Temmerman, P Oelhafen
1Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland. laurent.marot@unibas.ch
Rhodium films were developed for ITER plasma diagnostics mirrors, offering high reflectivity and durability. Magnetron sputtering produced high-quality films with excellent adhesion, crucial for reliable optical systems.
Area of Science:
- Materials Science
- Plasma Physics
- Optical Engineering
Background:
- Metallic mirrors are critical for ITER plasma diagnostics.
- Mirror performance degradation (reflectivity loss) impacts signal quality.
- Rhodium is a promising material due to high reflectivity and low sputtering yield.
Purpose of the Study:
- Develop a reliable technique for preparing high-reflectivity rhodium films.
- Evaluate rhodium films as a cost-effective alternative for ITER mirrors.
- Assess the performance and durability of rhodium-coated mirrors.
Main Methods:
- Magnetron sputtering was used to deposit rhodium films (up to 2 microm) onto various substrates (Mo, stainless steel, Cu).
- Film properties (roughness, crystallite size, structure, impurities) were analyzed.
- Scratch tests evaluated adhesion, and optical characterizations assessed reflectivity.
- Erosion tests were conducted under laboratory conditions and in the TEXTOR tokamak.
Main Results:
- Dense columnar rhodium films with low roughness and ~10 nm crystallite size were produced.
- No surface impurities were detected after deposition.
- Adhesion improved with substrate hardness.
- Optical characterizations and erosion test results were detailed.
Conclusions:
- Magnetron-sputtered rhodium films are suitable for ITER first mirrors.
- The developed technique yields high-quality films with good adhesion and reflectivity.
- Rhodium films offer a durable and reliable solution for plasma diagnostic systems.
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