Ion-implanted Nd:YVO(4) planar waveguide: refractive-index characterization and propagation mode reduction

Area of Science:

• Materials Science
• Optoelectronics
• Solid-State Physics

Background:

• Neodymium-doped yttrium orthovanadate (Nd:YVO4) is a crucial material for solid-state lasers.
• Developing integrated optical devices requires efficient waveguide formation in such crystalline materials.

Purpose of the Study:

• To achieve planar waveguide formation in Nd:YVO4 crystals for the first time.
• To investigate the reduction of propagation modes within these waveguides.
• To explore the effects of ion implantation and annealing on waveguide properties.

Main Methods:

• Formation of planar waveguides using 3.0-MeV silicon-ion implantation.
• Post-implantation annealing under controlled temperature and time conditions (240-400°C).
• Analysis of refractive index changes and propagation modes in the fabricated waveguides.

Main Results:

• An enhanced refractive index region (~2µm width) was formed, acting as a waveguide.
• As-implanted waveguides exhibited four propagation modes.
• Annealing reduced the number of modes to three, two, and one, with optimal single-mode operation achieved at specific temperatures and durations.
• Annealing at 400°C for 1 hour destroyed the monomode waveguide, eliminating all observed modes.

Conclusions:

• Planar waveguide formation and controlled propagation mode reduction in Nd:YVO4 are achievable via silicon-ion implantation and tailored annealing.
• The study demonstrates a method for creating single-mode waveguides in Nd:YVO4, crucial for integrated optoelectronic applications.
• Precise control over annealing parameters is essential for achieving desired waveguide characteristics and avoiding mode destruction.