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Updated: Jul 9, 2026

08:48
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Arresting ultraviolet-laser damage in fused silica
Optics Letters
|December 12, 2007
Abstract:
The 351-nm laser-damage initiation threshold for surface damage in conventionally polished fused silica is demonstrated to be stress dependent. By circumferential application of modest loads to a sample, a controllable stress field can be established within the clear aperture of a fused-silica specimen, in response to which both the damage-initiation fluence and the crack-propagation fluence requirements are increased above those for unstressed conditions.

