Photochemical processes induced by 157-nm light in H(2)-impregnated glassy SiO(2):OH

F(2) excimer-laser irradiation induces two major changes in SiO(2): OH glass impregnated with H(2) molecules. First, the vacuum-UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm(-1) . Second, preexisting free SiOH groups and interstitial H(2) are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si-O bonds that are absorbing in the edge region.