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Mid-infrared wire-grid polarizer with silicides
Itsunari Yamada1, Kenji Kintaka, Junji Nishii
1Department of Electronics and Informatics, Ryukoku University, Seta, Otsu, Japan.
Optics Letters
|February 5, 2008
Summary
This study presents a durable infrared (IR) polarizer using tungsten silicide (WSi) wire grids. The novel design enhances TM transmittance, offering superior performance for IR applications.
Area of Science:
- Optoelectronics
- Materials Science
- Nanotechnology
Background:
- Conventional infrared (IR) polarizers often lack durability and microfabrication compatibility.
- Enhancing transverse magnetic (TM) transmittance is crucial for efficient IR polarizer performance.
Purpose of the Study:
- To fabricate a novel IR polarizer utilizing tungsten silicide (WSi) wire grid technology.
- To improve TM transmittance and the extinction ratio for broadband IR applications.
- To assess the durability and microfabrication compatibility of the developed polarizer.
Main Methods:
- Fabrication of a WSi wire grid polarizer using two-beam interference exposure and reactive ion etching.
- Deposition of silicon monoxide (SiO) between the WSi wire grid and Si substrate to enhance TM transmittance.
- Characterization of transmittance spectra and TM/TE transmittance ratios across various IR wavelengths.
Main Results:
- Achieved over 80% transmittance in the 4-5 micrometer wavelength range.
- Demonstrated a TM/TE transmittance ratio exceeding 100 (20 dB) from 2.5-6 micrometers.
- The fabricated polarizer exhibited high durability and excellent compatibility with microfabrication processes.
Conclusions:
- The developed WSi wire grid IR polarizer offers significant performance improvements over conventional designs.
- The integration of silicon monoxide effectively enhances TM transmittance for broadband IR applications.
- This technology presents a promising, robust, and manufacturable solution for IR polarization.
