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Optimal usage of available wiring resources in diffractive-reflective optoelectronic multichip modules
Applied Optics
|February 13, 2008
Summary
This study presents an analytical model for exploring interconnection networks in massively parallel processing systems. It analyzes how technological and architectural parameters impact optimal network design for ultracompact systems.
Area of Science:
- Computer Engineering
- Electrical Engineering
- Materials Science
Background:
- VLSI and optoelectronic multichip module technologies enable ultracompact, massively parallel processing systems.
- Technological parameters significantly influence wirability and delay characteristics, impacting system architecture.
Purpose of the Study:
- To present an analytical model for design space exploration of interconnection networks in multinode chips on a single multichip module substrate.
- To evaluate system designs using a two-level interconnect with k-ary-n-cube networks for interchip and intrachip communication.
Main Methods:
- Development of an analytical model for interconnection network design space exploration.
- Evaluation of system designs with a two-level interconnect structure.
- Analysis of k-ary-n-cube networks for interchip and intrachip communication.
Main Results:
- The study analyzes the impact of architectural and technological parameters on network implementation.
- Optimal network implementation is determined based on average no-load latency.
- Design space exploration identifies trade-offs in network performance.
Conclusions:
- Technological and architectural parameters are critical for optimizing interconnection networks in parallel processing systems.
- The presented model facilitates informed design decisions for ultracompact systems.
- Understanding latency impacts is key to efficient network implementation.
