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Unstable Cr:LiSAF laser resonator with a variable reflectivity output coupler.

J F Pinto1, L Esterowitz

  • 1U.S. Naval Research Laboratory, Code 5641, Washington, D.C. 20375, USA.

Applied Optics
|February 15, 2008
PubMed
Summary

A novel laser resonator using a super-Gaussian mirror produced a smooth beam profile, ideal for nonlinear frequency conversion. This system achieved tunable ultraviolet radiation from 267 to 290 nm.

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Area of Science:

  • Laser physics
  • Nonlinear optics
  • Materials science

Background:

  • Flash-lamp-pumped lasers are crucial for various applications.
  • Variable reflectivity mirrors are key components in laser resonator design.
  • Cr:LiSAF (Chromium-doped Lithium Strontium Aluminum Fluoride) is a promising laser medium.

Purpose of the Study:

  • To investigate the performance of a flash-lamp-pumped Cr:LiSAF unstable laser resonator.
  • To evaluate the impact of a fourth-order super-Gaussian variable reflectivity mirror on beam profile and laser performance.
  • To explore the generation of tunable ultraviolet radiation using this laser system.

Main Methods:

  • Utilized a flash-lamp-pumped Cr:LiSAF unstable laser resonator.
  • Employed a fourth-order super-Gaussian variable reflectivity mirror as the output coupler.
  • Compared long-pulse and Q-switched operation with stable resonator configurations.
  • Performed frequency mixing with lithium triborate (LBO) and beta-barium borate (BBO) nonlinear crystals.

Main Results:

  • The super-Gaussian mirror generated a smooth, flattop transverse beam profile in the near field.
  • This beam profile is advantageous for nonlinear frequency-conversion applications.
  • Achieved tunable ultraviolet (UV) radiation in the range of 267 to 290 nm.
  • Compared the performance of the unstable resonator in long-pulse and Q-switched modes.

Conclusions:

  • The Cr:LiSAF unstable laser resonator with a super-Gaussian mirror offers a superior beam profile for nonlinear optics.
  • The system demonstrates efficient generation of tunable UV radiation.
  • This technology holds potential for applications requiring specific UV wavelengths.