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Compact Lens-less Digital Holographic Microscope for MEMS Inspection and Characterization

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Ultrastable absolute-phase common-path optical profiler based on computer-generated holography.

N B Sawyer, C W See, M Clark

|February 28, 2008

Summary

A novel scanning interferometric profiler utilizes a computer-generated hologram for stable, absolute-phase measurements. This exceptionally stable system enables simultaneous form and texture analysis, demonstrating practical applications.

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Area of Science:

Optical Engineering
Metrology
Interferometry

Background:

Traditional interferometric profilers often lack stability due to environmental factors like piston microphonics.
Achieving absolute-phase measurement typically requires complex setups that can compromise common-path configurations.
Simultaneous measurement of both surface form and texture presents a significant metrological challenge.

Purpose of the Study:

To introduce a new scanning common-path interferometric profiler designed for absolute-phase measurement.
To demonstrate the exceptional stability of the profiler by minimizing sensitivity to piston microphonics.
To enable simultaneous form and texture measurements using a single optical configuration.

Main Methods:

Development of a scanning common-path interferometric profiler.
Incorporation of a computer-generated hologram as the key beam-splitting element.
Experimental validation of the profiler's operation and stability in both scanning and single-shot modes.

Main Results:

The profiler achieves absolute-phase measurement with exceptional stability due to its common-path design.
The system effectively mitigates issues related to piston microphonics, enhancing measurement reliability.
Experimental results confirm the profiler's capability for simultaneous form and texture analysis.

Conclusions:

The developed scanning common-path interferometric profiler offers a stable and versatile solution for absolute-phase metrology.
The use of a computer-generated hologram is key to the system's stability and dual-measurement capability.
This technology advances surface characterization by enabling simultaneous form and texture assessment.