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New adaptive mesh development for accurate near-field enhancement computation
T Grosges1, H Borouchaki, D Barchiesi
1Laboratory of Automatic Mesh Generation and Adaptation Methods - GAMMA Project - University of Technology of Troyes, 12 Rue Marie Curie - BP 2060, F-10010 Troyes Cedex, France. thomas.grosges@utt.fr
Journal of Microscopy
|February 29, 2008
Summary
Accurate near-field enhancement computation is crucial for plasmonic nanostructure optimization. A new adaptive mesh process for the finite element method (FEM) drastically accelerates convergence and reduces computational costs.
Area of Science:
- Plasmonics and Nanophotonics
- Computational Electromagnetics
- Numerical Methods
Background:
- Accurate near-field enhancement computation is vital for optimizing plasmonic nanostructures.
- Existing methods like Green's dyadic are established, but challenges remain for the finite element method (FEM).
- FEM's efficiency is linked to non-Cartesian meshes, posing computational hurdles.
Purpose of the Study:
- To develop an efficient adaptive mesh process for FEM in plasmonics.
- To address the open problem of accurate near-field enhancement computation using FEM with non-Cartesian meshes.
- To significantly improve computational speed and reduce resource requirements.
Main Methods:
- Introduction of a novel adaptive mesh process.
- Utilizing a posteriori error indicator estimation based on the physical solution.
- Application to finite element method (FEM) computations.
Main Results:
- Drastic acceleration of solution convergence.
- Significant minimization of memory requirements.
- Substantial reduction in overall computational time.
Conclusions:
- The proposed adaptive mesh process offers a breakthrough for FEM in plasmonics.
- This method enhances the feasibility of complex nanostructure optimization.
- It paves the way for more efficient and accessible plasmonic device design.
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