Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview
Series RLC Circuit with Source
Node Analysis for AC Circuits
The Electrical Double Layer
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Implementation of a Hyperbolic Vortex Plasma Reactor for the Removal of Micropollutants in Water
Published on: July 25, 2025
Kyoung-Jae Chung1, Soon-Wook Jung, Jae-Myung Choe
1Department of Nuclear Engineering, Seoul National University, Gwanak-Gu, Seoul, Republic of Korea.
A new circuit model accurately simulates plasma source ion implantation systems. This model, validated by experiments, describes the dynamic behavior of pulsed plasma sheaths and external circuits.
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