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Implementation of a Reference Interferometer for Nanodetection
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Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom

P P Naulleau1, K A Goldberg, S H Lee

  • 1Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA. pnaulleau@lbl.gov

Applied Optics
|March 8, 2008
PubMed
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The phase-shifting point-diffraction interferometer (PS/PDI) accurately measures extreme-ultraviolet (EUV) lithography optics. This study quantifies its precision and identifies key error sources for improved performance.

Area of Science:

  • Optical metrology
  • Lithography system characterization
  • Extreme-ultraviolet (EUV) optics

Background:

  • The phase-shifting point-diffraction interferometer (PS/PDI) is a novel instrument for characterizing projection optical systems.
  • Accurate characterization of extreme-ultraviolet (EUV) optics is critical for advanced lithography.

Purpose of the Study:

  • To quantitatively assess the accuracy and precision of the PS/PDI for EUV lithography.
  • To identify and analyze sources of error affecting the interferometer's performance.
  • To calibrate the PS/PDI using a null test method.

Main Methods:

  • Implementation of the PS/PDI at Lawrence Berkeley National Laboratory.
  • Quantitative characterization of interferometer accuracy and precision.

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  • Comparison of experimental measurements with theoretical predictions.
  • Utilizing a null test to identify systematic and random errors.

    • Main Results:

    • The EUV PS/PDI demonstrates high accuracy in characterizing optical systems.
    • Identified systematic errors from measurement geometry and reference wave imperfections.
    • Achieved a systematic error-limited reference-wave accuracy of 0.0028 waves (lambda/357) at 13.5 nm.
    • Characterization performed within a numerical aperture of 0.082.

    Conclusions:

    • The PS/PDI is a valuable tool for precise EUV optical system metrology.
    • Understanding error sources is crucial for calibrating and optimizing interferometer performance.
    • The validated accuracy supports its application in advanced lithography development.