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Electron beam modification of polymer nanospheres
1Nanoscale Physics Research Laboratory, School of Physics and Astronomy, University of Birmingham, Birmingham B15 2TT, United Kingdom.
Journal of Nanoscience and Nanotechnology
|March 12, 2008
Summary
Electron beam exposure shrinks polystyrene spheres, enabling tunable nanosphere lithography. This process also enhances sphere resistance to oxygen plasma, opening new fabrication possibilities.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Chemistry
Background:
- Self-assembled polystyrene spheres are crucial for nanosphere lithography.
- Controlling sphere size and surface properties is key for advanced nanofabrication.
Purpose of the Study:
- To investigate the effects of electron beam exposure on polystyrene spheres.
- To explore the potential of electron beam modification for nanosphere lithography and plasma resistance.
Main Methods:
- Polystyrene spheres (500 nm diameter) on silicon oxide were exposed to an electron beam in a scanning electron microscope.
- Dose-dependent changes in sphere diameter and surface chemistry were analyzed.
Main Results:
- Electron beam exposure at room temperature reduced sphere diameter by ~13% for a dose of 9.9 mC/cm2.
- Surface chemistry modification increased resistance to oxygen plasma processing.
Conclusions:
- Electron beam exposure provides a method to precisely tune sphere size for nanosphere lithography.
- This technique enhances sphere durability for subsequent processing steps, improving fabrication control.
