Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Experiment Video

Updated: Jul 6, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Fast, high bit number pattern generator for electron and ion beam lithographies.

Giovanni Pennelli1

  • 1Dipartimento di Ingegneria della Informazione: Elettronica, Informatica, Telecomunicazioni, Università di Pisa, Via G. Caruso, I-56122 Pisa, Italy. g.pennelli@iet.unipi.it

The Review of Scientific Instruments
|April 2, 2008
PubMed
Summary

This study presents a novel pattern generator for high-resolution nanofabrication. The system achieves 18-bit resolution at 10 MHz, enhancing precision and speed for electron and ion beam lithography.

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Nanostructured silicon devices for thermoelectric applications.

Nanotechnology·2026
Same author

Shallow periodic patterns on silicon nanostructures for engineered thermal conductivity reduction.

Scientific reports·2026
Same author

On-chip silicon thermal diode: nanostructure spacing dependence of the thermal rectification ratio.

Nanotechnology·2025
Same author

On-Chip Thermoelectric Devices Based on Standard Silicon Processing.

Small (Weinheim an der Bergstrasse, Germany)·2024
Same author

Roadmap on thermoelectricity.

Nanotechnology·2023
Same author

Silicon Nanowires: A Breakthrough for Thermoelectric Applications.

Materials (Basel, Switzerland)·2021

Area of Science:

  • Nanotechnology and Nanofabrication
  • Advanced Instrumentation
  • Materials Science

Background:

  • Electron and ion beam lithographies are crucial for nanofabrication, demanding high-speed, high-precision pattern generators.
  • Existing pattern generators face limitations in balancing resolution (bit number) and writing speed.
  • Applications like scanning probe microscopy and nanomanipulation also require precise, high-speed control voltage generation.

Purpose of the Study:

  • To develop a pattern generator solution that increases bit resolution without compromising system speed.
  • To present a novel hardware and software approach for enhanced pattern generation.
  • To ensure the pattern generator's flexibility and adaptability for diverse nanofabrication strategies.

Main Methods:

More Related Videos

Advanced Experimental Methods for Low-temperature Magnetotransport Measurement of Novel Materials
10:36

Advanced Experimental Methods for Low-temperature Magnetotransport Measurement of Novel Materials

Published on: January 21, 2016

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

Related Experiment Videos

Last Updated: Jul 6, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Advanced Experimental Methods for Low-temperature Magnetotransport Measurement of Novel Materials
10:36

Advanced Experimental Methods for Low-temperature Magnetotransport Measurement of Novel Materials

Published on: January 21, 2016

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

  • Development and testing of a prototype pattern generator.
  • Implementation of a hardware solution achieving effective 18-bit resolution.
  • Integration of software solutions to optimize data transfer efficiency.
  • Testing the system at a write speed of 10 MHz.

    • Main Results:

    • Successful testing of a prototype pattern generator with 18-bit resolution.
    • Achieved a high writing speed of 10 MHz, preserving system performance.
    • Demonstrated the general applicability of the solution to various high-precision, high-speed control voltage applications.
    • Validated software solutions for improved data transfer efficiency.

    Conclusions:

    • The developed pattern generator effectively increases bit number while maintaining high speed, crucial for advanced nanofabrication.
    • The hardware and software solutions offer a versatile tool applicable to fields beyond lithography, such as scanning probe microscopy and nanomanipulation.
    • The system's design prioritizes flexibility, allowing adaptation to different writing strategies and future technological advancements.