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Published on: November 16, 2019
Reflection photoelastic tomography for the detection of stress distribution in planar optical waveguides
Silvia Maria Pietralunga1, Maddalena Ferrario, Alberto Licciardello
1CoreCom, Via G. Colombo 81, Milan, Italy.
Abstract:
A novel method for measuring local stress distributions and birefringence of films on substrates and planar optical waveguides, with submicrometric resolution, is presented. The technique relies on a reflective tomographic configuration, applied in conjunction with a polarimetric setup, which processes the stress-induced change of the state of polarization of a laser probe beam reflected at the waveguide-substrate (film-substrate) interface. By this means, theoretically foreseen stress behavior can be experimentally verified and spurious or induced local stress variations in integrated optics components can also be brought into evidence. The feasibility of the proposed method has been verified by reconstructing the two-dimensional axial stress distribution in the 4 x 2 microm(2) core region of a doped silica-on-silicon optical waveguide.
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