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Characterization of implantation induced defects in Si-implanted SiO2 film

Xiaopeng Hao1, Chunlan Zhou, Runsheng Yu

  • 1Key Laboratory of Nuclear Analysis Techniques, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China.

Journal of Nanoscience and Nanotechnology
|May 13, 2008
PubMed

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