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Aperiodic multilayers with enhanced reflectivity for extreme ultraviolet lithography.

Michele Suman¹, Maria-Guglielmina Pelizzo, Piergiorgio Nicolosi

¹Information Engineering Department, University of Padova, Padova, Italy. sumanmic@dei.unipd.it

|June 3, 2008

Summary

Novel aperiodic multilayers offer superior performance for extreme ultraviolet lithography (EUVL). These advanced coatings minimize absorption, enhancing durability and lifetime for critical lithographic applications.

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Area of Science:

Materials Science
Nanotechnology
Optics

Background:

Extreme ultraviolet lithography (EUVL) is crucial for semiconductor manufacturing.
Current periodic multilayers face limitations in performance and durability.
Environmental degradation of capping layers impacts lithography tool lifetime.

Purpose of the Study:

To develop novel aperiodic multilayers for enhanced EUVL performance.
To design coatings with improved environmental resistance and extended operational life.
To investigate the impact of aperiodic structures on absorption and capping layer sensitivity.

Main Methods:

Utilized an optimization algorithm to design aperiodic multilayer structures.
Incorporated domain knowledge acquisition within the solution space.

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Developed and tested prototype capped aperiodic coatings.

Main Results:

Estimated integrated intensity increase of up to 2.18 times compared to standard periodic multilayers.
Demonstrated minimal absorption in topmost layers of aperiodic structures.
Showcased insensitivity to capping layer material choice and degradation.

Conclusions:

Aperiodic multilayers provide superior performance and durability for EUVL.
The developed coatings offer a significant increase in integrated intensity.
These advancements promise extended lifetime and improved reliability in lithographic processes.