Inverse design for phase mask lithography
James W Rinne1, Sidhartha Gupta, Pierre Wiltzius
1Department of Materials Science and Engineering and the Beckman Institute for Advanced Science and Technology, University of Illinois, Urbana, Illinois 61801, USA.
Optics Express
|June 11, 2008
Abstract:
We have developed a method for designing the diffractive optics used in phase mask lithography. Genetic algorithms were used to inverse-design a grating's relief profile and associated exposure conditions so that desired periodic structures are formed. An experimentally promising grating designed to produce helices is demonstrated.
