Design of holographic structures using genetic algorithms

We have developed a general technique using genetic algorithms to design photonic crystals to be fabricated by holographic lithography. In contrast to current analytical approaches that rely almost exclusively on symmetry considerations, this technique allows for high-fidelity approximations to real-space structures without limiting the search space to a prescribed set of symmetries. We have used this new technique to design a structure having a complete photonic band gap of 28%, the largest yet reported for holographic lithography.