Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling
Peter de Groot1, Xavier Colonna de Lega, Jan Liesener
1Zygo Corporation, Laurel Brook Road, Middlefield, CT 06457, USA. peterd@zygo.com
Optics Express
|June 11, 2008
Abstract:
Rigorous coupled wave analysis (RCWA) interprets 3D white-light interference microscopy profiles and reveals the dimensions of optically-unresolved surface features. Measurements of silicon etch depth of a 450-nm pitch grating structure correlate to atomic force microscopy with R(2)= 0.995 and a repeatability of 0.11nm. This same technique achieves a <1nm sensitivity to 80-nm lateral widths of 190-nm pitch gratings using a 570-nm mean wavelength.


