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Two-beam-current method for e-beam writing gray-scale masks and its application to high-resolution microstructures.

Zhou Zhou1, Sing H Lee

  • 11Department of Electrical and Computer Engineering, University of California at San Diego, 9500 Gilman Drive, La Jolla, California 92093-0407, USA. joe@triagewireless.com

Applied Optics
|June 12, 2008
PubMed
Summary

A novel two-beam-current method enhances electron-beam (e-beam) writing for gray-scale mask fabrication. This technique significantly expands dynamic range and reduces writing time for high-resolution micro-optical elements.

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Area of Science:

  • Materials Science
  • Optical Engineering
  • Nanotechnology

Background:

  • Electron-beam (e-beam) lithography is crucial for fabricating micro- and nano-scale devices.
  • Current methods for gray-scale mask fabrication have limitations in dynamic range and writing speed.
  • Accurate gray-scale masks are essential for creating complex micro-optical elements.

Purpose of the Study:

  • To introduce and detail a new two-beam-current method for e-beam writing.
  • To demonstrate the application of this method in fabricating advanced gray-scale masks.
  • To utilize these improved masks for creating high-resolution micro-optical elements.

Main Methods:

  • Development and description of a two-beam-current e-beam writing technique.
  • Fabrication of gray-scale masks using the novel method.

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  • Application of fabricated masks in deep ultraviolet (DUV) lithography (248 nm) and inductively coupled plasma reactive ion etching (ICP-RIE).

    • Main Results:

    • The two-beam-current method achieves a significantly larger dynamic range for e-beam exposure compared to single-current methods.
    • Writing time for gray-scale masks, especially for large patterns, is substantially reduced.
    • Fabricated micro-optical elements exhibit large dynamic range and high resolution, with depths in the micrometer range.

    Conclusions:

    • The two-beam-current method is a superior technique for e-beam gray-scale mask fabrication.
    • This advancement enables the efficient production of sophisticated micro-optical elements.
    • The improved masks and fabrication process open new possibilities in micro-optics and related fields.