Related Experiment Video
Updated: Jul 3, 2026
07:44
Production and Characterization of Vacuum Deposited Organic Light Emitting Diodes
Published on: November 16, 2018
Acid-sensitive semiperfluoroalkyl resorcinarene: an imaging material for organic electronics
Jin-Kyun Lee1, Margarita Chatzichristidi, Alexander A Zakhidov
1Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA.
Journal of the American Chemical Society
|August 9, 2008
Summary
A novel acid-sensitive resorcinarene was developed for advanced lithography. This material
Area of Science:
- Supramolecular Chemistry
- Materials Science
- Lithography
Background:
- Resorcinarenes are macrocyclic compounds with diverse applications.
- Developing new materials for organic electronics patterning is crucial.
Purpose of the Study:
- To synthesize and characterize an acid-sensitive semiperfluoroalkyl resorcinarene.
- To evaluate its lithographic properties and potential in patterning organic electronic materials.
Main Methods:
- Synthesis of a novel semiperfluoroalkyl resorcinarene derivative.
- Solubility testing in hydrofluoroether solvents.
- Evaluation of lithographic patterning capabilities.
Main Results:
- The synthesized resorcinarene exhibits acid sensitivity.
- Excellent solubility was observed in segregated hydrofluoroether solvents.
- Successful patterning of delicate organic electronic materials was demonstrated.
Conclusions:
- The acid-sensitive resorcinarene is a promising material for advanced lithography.
- Its unique solubility profile allows for precise patterning of organic electronics.
- This work contributes to the development of next-generation electronic devices.
