Automated apparatus for evaporation and in situ measurements of multiple thin films
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Published on: April 7, 2017
W H Clark1, S J Brient, R L Longbrake
1Department of Physics, The University of Texas at El Paso, El Paso, Texas 79968.
Abstract:
We describe a system for vacuum deposition which measures as well as controls substrate temperature, film thickness, and rate of evaporation. By measuring the resonant frequency of a quartz crystal oscillator which has been calibrated for thickness, we produce films of 11 different thicknesses in a single evaporation. The system is then capable of immediately initiating four-probe resistivity measurements on the evaporated films every 90 s, allowing the measurement of rapid structural changes. The system is calculator-based and interfacing is achieved with plug-in compatible instrumentation using the IEEE standard 488-1975 interface bus.
