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Updated: Jul 2, 2026

Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle
Published on: January 3, 2016
Plasmonic nearfield scanning probe with high transmission
Yuan Wang1, Werayut Srituravanich, Cheng Sun
1National Science Foundation (NSF) Nanoscale Science and Engineering Center (NSEC), 5130 Etcheverry Hall, University of California, Berkeley, California 94720-1740, USA.
Plasmonic nearfield scanning optical microscopy (NSOM) enhances light focusing for sub-diffraction imaging and nanolithography. This breakthrough overcomes limitations of conventional NSOM, enabling high-resolution applications.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Nearfield scanning optical microscopy (NSOM) provides sub-diffraction limit resolution for imaging and nanolithography.
- Conventional NSOM is limited by significant light attenuation through subwavelength apertures.
Purpose of the Study:
- To develop an efficient plasmonic nearfield scanning optical microscope (NSOM) for enhanced nearfield focusing.
- To overcome the light attenuation limitations of conventional NSOM probes.
Main Methods:
- Development of plasmonic NSOM probes utilizing surface plasmon excitation.
- Characterization of nearfield light confinement and intensity.
- Nearfield lithography experiments to demonstrate probe efficiency.
Main Results:
- Plasmonic NSOM probes confine light into a 100 nm spot.
- Nearfield intensity is at least one order of magnitude higher than conventional NSOM probes.
Conclusions:
- The developed plasmonic NSOM offers significantly improved efficiency for nearfield applications.
- This technology is suitable for high-resolution nanolithography, data storage, and cellular visualization.
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