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Updated: Jul 2, 2026

Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces
Published on: June 7, 2019
Ting Xu1, Yanhui Zhao, Junxian Ma
1State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209, China.
Researchers developed a new interference lithography method using anisotropic metamaterials. This technique overcomes the diffraction limit to create 40nm nanostructures, offering a novel way to fabricate large-area nanostructures.
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