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Updated: Jun 28, 2026
09:41
Emission Spectroscopic Boundary Layer Investigation during Ablative Material Testing in Plasmatron
Published on: June 9, 2016
Plasma emission sources in analytical spectroscopy--II
S Greenfield1, H M McGeachin, P B Smith
1Albright & Wilson Limited, Industrial Chemicals Division, P.O. Box 80, Oldbury, Warley, England.
Talanta
|July 1, 1975
Summary
This review covers microwave plasmas and capacitively coupled high-frequency plasmas for emission spectrochemical analysis. These plasma sources offer versatile applications in elemental analysis.
Area of Science:
- Analytical Chemistry
- Plasma Physics
Background:
- Emission spectrochemical analysis relies on plasma sources for elemental detection.
- Microwave and high-frequency plasmas are established techniques in analytical chemistry.
Purpose of the Study:
- To review the application of microwave plasmas.
- To review the application of capacitively coupled high-frequency plasmas.
- To assess their utility as sources for emission spectrochemical analysis.
Main Methods:
- Literature review of plasma sources.
- Analysis of emission spectroscopy principles.
- Comparison of plasma characteristics for analytical applications.
Main Results:
- Microwave plasmas provide efficient atomization and excitation.
- Capacitively coupled high-frequency plasmas offer stable and reproducible analytical signals.
- Both plasma types are suitable for diverse elemental analysis tasks.
Conclusions:
- Microwave and high-frequency plasmas are effective sources for emission spectrochemical analysis.
- The choice of plasma depends on specific analytical requirements.
- Further optimization can enhance their analytical performance.
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