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Contrast mechanism due to interface trapped charges for a buried SiO2 microstructure in scanning electron microscopy

Hai-Bo Zhang1, Wei-Qin Li, Dan-Wei Wu

  • 1Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Department of Electronic Science and Technology, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China. hbzhang@mail.xjtu.edu.cn

Journal of Electron Microscopy
|November 26, 2008
PubMed

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