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Room temperature detachment nanolithography using a rigiflex polymeric mold.

Jae Kwan Kim¹, Kahp Y Suh

¹School of Mechanical and Aerospace Engineering, Institute of Advanced Machinery and Design, Seoul National University, Seoul 151-742, Korea.

Journal of Nanoscience and Nanotechnology

|December 5, 2008

Summary

This study introduces room-temperature detachment nanolithography for organic thin films using ultraviolet (UV) light. This method creates well-defined nanopatterns without residual layers, improving film surface quality.

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Area of Science:

Materials Science
Nanotechnology
Surface Chemistry

Background:

Organic thin films are crucial for electronic devices.
Existing nanolithography techniques often require high temperatures or leave residual layers.
Developing room-temperature, residue-free patterning methods is essential for efficient organic electronics fabrication.

Purpose of the Study:

To demonstrate a novel detachment nanolithography technique for organic thin films at room temperature.
To investigate the role of ultraviolet (UV) exposure in improving the detachment process.
To characterize the resulting nanopatterned films and assess surface cleanliness.

Main Methods:

Utilized a nanopatterned, UV-curable polyurethane acrylate (PUA) mold.
Applied the mold to a spin-coated 4,4'-bis[N-1-napthyl-N-phenyl-amino]biphenyl (NPB) organic film under low pressure (1-2 bar).
Investigated the effect of short-term UV exposure on the detachment process and film surface.
Analyzed film surface contamination and cohesive forces using Fourier transform infrared (FTIR) spectroscopy and water contact angle measurements.

Main Results:

Achieved well-defined nanopatterns on silicon and gold substrates without a residual layer.
UV exposure significantly enhanced the detachment process.
The UV-treated surface exhibited reduced hydrocarbon contamination and lower cohesive force.

Conclusions:

Detachment nanolithography at room temperature is a viable method for patterning organic thin films.
UV exposure is critical for achieving efficient, residue-free patterning and surface purification.
This technique offers a promising route for fabricating high-quality organic electronic components.