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Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform
Ning Zhu1, Jun Song, Lech Wosinski
1Joint Research Center of Photonics of the Royal Institute of Technology, Department of Microelectronics and Applied Physics, Kista, Sweden. ningz@kth.se
Optics Letters
|February 3, 2009
Abstract:
We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3 to 1.5 microm with three channels located at 1310, 1490, and 1550 nm and with a footprint of 150 micromx130 microm.
