Related Experiment Video
Updated: Jun 25, 2026
Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
The future of lithography: SEMATECH Litho Forum 2008
C Grant Willson1, Bernard J Roman
1Department of Chemical Engineering, The University of Texas at Austin, 1 University Station C0400, Austin, Texas 78712-0231, USA. willson@che.utexas.edu
Abstract:
The biannual SEMATECH Litho Forum was held May 12-14, 2008 in Bolton Landing, NY, not far from SEMATECH's facility at Albany Nanotech. This biannual meeting is designed to assess the progress in advanced patterning technology and to produce consensus about the processes that will be used to manufacture the next generations of devices. A summary of the key ideas presented at the meeting is given in this paper, along with the future challenges and opportunities in emerging lithographic technologies.
