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Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
De-en Jiang1, Mao-Hua Du, Sheng Dai
1Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA. jiangd@ornl.gov
Annealing ruthenium (Ru) metal with carbon impurities facilitates large-scale graphene growth. Density functional theory reveals buckling in graphene due to carbon-ruthenium bonding, with a more stable 3.0 nm superstructure.
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