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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Focused electron-beam-induced deposition of 3 nm dots in a scanning electron microscope

Leon van Kouwen1, Aurelien Botman, Cornelis W Hagen

  • 1Delft University of Technology, Faculty of Applied Sciences, Lorentzweg 1, 2628 CJ, Delft, The Netherlands.

Nano Letters
|April 21, 2009
PubMed

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