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Pattern size reduction effect via a "mix and match" sequential imprinting technique.

K S L Chong1, H Y Low

  • 1Institute of Materials Research and Engineering, A*STAR, 3 Research Link, Singapore 117602, Singapore.

Langmuir : the ACS Journal of Surfaces and Colloids
|May 2, 2009
PubMed
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This study introduces a novel "mix and match" sequential imprinting technique for nanoimprint lithography. This method achieves tunable gap sizes, including reduction effects, for creating nanometer-sized metal lines without expensive molds.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Lithography

Background:

  • Traditional nanoimprint lithography (NIL) is a one-to-one pattern replication process.
  • Fabricating unique molds for each pattern design is costly and time-consuming.

Purpose of the Study:

  • To develop a "mix and match" sequential imprinting technique for NIL.
  • To achieve tunable line-space patterns with varying gap sizes, including size reduction.

Main Methods:

  • Utilized a "mix and match" sequential imprinting approach.
  • Combined different mold feature sizes and alignments.
  • Applied the technique to imprint polystyrene.

Main Results:

  • Achieved line-space patterns with gap sizes smaller than the molds, demonstrating a size reduction effect.

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  • Obtained a significant gap size reduction of up to 93% in imprinted polystyrene.
  • Successfully used the reduced gap patterns as shadow masks for depositing nanometer-sized metal lines.

    • Conclusions:

    • The "mix and match" sequential imprinting technique offers tunable pattern fabrication.
    • This method eliminates the need for designing and purchasing new, expensive imprinting molds.
    • The size reduction effect enables efficient fabrication of nanometer-scale features for applications like metal line deposition.