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Updated: Jun 23, 2026

Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes
Published on: June 25, 2020
Highly ordered catalyst-free and mask-free GaN nanorods on r-plane sapphire
T Aschenbrenner1, C Kruse, G Kunert
1Institute of Solid State Physics, Semiconductor Epitaxy, University of Bremen, Otto-Hahn-Allee NW1, Bremen, Germany. tasche@ifp.uni-bremen.de
Abstract:
Self-organized and highly ordered GaN nanorods were grown without catalyst on r-plane sapphire using a combination of molecular beam epitaxy and metal-organic vapor-phase epitaxy. AlN nucleation centers for the nanorods were prepared by nitridation of the sapphire in a metal-organic vapor-phase epitaxy reactor, while the nanorods were grown by molecular beam epitaxy. A coalesced two-dimensional GaN layer was observed between the nanorods. The nanorods are inclined by 62 degrees towards the [Formula: see text]-directions of the a-plane GaN layer. The high degree of ordering and the structural perfection were confirmed by micro-photoluminescence measurements.

