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Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
Published on: January 23, 2013
Direct surface structuring of organometallic resists using nanoimprint lithography
Canet Acikgoz1, Mark A Hempenius, G Julius Vancso
1Molecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.
Nanotechnology
|May 8, 2009
Summary
Poly(ferrocenylmethylphenylsilane) (PFMPS) shows promise as a novel imprint resist for nanoimprint lithography. Its high etch resistance enables effective pattern transfer into silicon substrates, achieving high aspect ratios.
Area of Science:
- Materials Science
- Nanotechnology
- Lithography
Background:
- Nanoimprint lithography (NIL) requires specialized resist materials for pattern fabrication.
- Developing novel resists with enhanced properties is crucial for advancing NIL capabilities.
Purpose of the Study:
- To investigate poly(ferrocenylmethylphenylsilane) (PFMPS) as a new imprint resist for NIL.
- To evaluate the performance of PFMPS in pattern transfer into silicon substrates.
Main Methods:
- Synthesis and characterization of PFMPS.
- Imprinting experiments to form polymer patterns.
- Reactive ion etching to transfer patterns into silicon.
- Optimization of imprinting parameters like molar mass and film thickness.
Main Results:
- PFMPS demonstrates high resistance to reactive ion etching due to its iron and silicon content.
- Successful pattern transfer into silicon substrates was achieved.
- Decreasing initial film thickness improved residual layer removal and pattern transfer.
- Argon plasma treatment facilitated residual layer removal, enabling pattern transfer with aspect ratios up to 4:1 and reduced surface roughness.
Conclusions:
- PFMPS is a viable candidate for NIL applications, offering excellent etch resistance.
- Optimizing film thickness and residual layer removal are key for high-fidelity pattern transfer.
- This work contributes to the development of advanced materials for high-resolution nanopatterning.
