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Related Experiment Video

Updated: Jun 23, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
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Published on: January 19, 2020

Hierarchical and nanosized pattern formation using dual beam focused ion beam microscope.

Kathy Lu1

  • 1Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University, 213 Holden Hall, M/C 0237, Blacksburg, VA 24061, USA.

Journal of Nanoscience and Nanotechnology
|May 15, 2009
PubMed
Summary

This study explores dual ion and electron beam microscopy for advanced nanofabrication. The technique precisely creates hierarchical nanopatterns, overcoming limitations in current fabrication processes.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Engineering

Background:

  • Direct and controlled nanopatterning is crucial in nanofabrication.
  • Dual ion and electron beam microscopy combines high-resolution imaging with ion beam patterning.
  • Existing nanofabrication methods have limitations in creating complex nanopatterns.

Purpose of the Study:

  • To investigate the potential of dual ion and electron beam microscopy for creating diverse nanopatterns.
  • To explore the fabrication of hierarchical sized and shaped nanopatterns.
  • To demonstrate selective modification of nanofeatures using this technique.

Main Methods:

  • Utilized a dual ion and electron beam microscope for simultaneous imaging and patterning.
  • Employed focused ion beam (FIB) to create nanotrack and nanopore patterns on aluminum substrates.

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  • Implemented low-dose ion sweeping for selective modification of nanofeature dimensions.

    • Main Results:

    • Successfully fabricated nanotrack and nanopore patterns with precise control over dimensions (track width < 32 nm, pore size < 50 nm).
    • Achieved precise alignment of nanopores to form hierarchical patterns.
    • Demonstrated selective modification of nanopatterns by altering local nanofeature dimensions.

    Conclusions:

    • Dual beam focused ion beam (FIB) technique offers advanced capabilities for nanopatterning.
    • This method overcomes limitations of current nanofabrication processes.
    • The technique enables the creation of innovative nanopatterns for various applications.