Patterning of ZnO Quantum Dot and PMMA Hybrids with a Solvent-Assisted Technique

Imprinting of nanoparticle-polymer hybrids has been a challenging task due to the agglomeration of nanoparticles, especially for metal oxides because of their highly hydrophilic and polar surfaces. We hereby report an effective submicron patterning process of ZnO quantum dot/poly(methyl methacrylate) hybrids with a solvent-assisted lithographic technique. Feature sizes down to 250 nm have been achieved with a ZnO content up to 50 vol %, about 10 times higher than the literature-reported inorganic contents. With higher ZnO contents, particles show a tendency to aggregate, and the samples have less flexibility as demonstrated by larger bending radii before failure. The higher ZnO content samples also produce stronger photoluminescence responses. This family of materials has a great potential to be used in flexible optical devices.