Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Silent pulmonary thromboembolism in neurosurgery patients: Report of 2 cases and literature review.

Medicine·2016
Same author

Robust Pedestrian Classification Based on Hierarchical Kernel Sparse Representation.

Sensors (Basel, Switzerland)·2016
Same author

MiR-155 and its functional variant rs767649 contribute to the susceptibility and survival of hepatocellular carcinoma.

Oncotarget·2016
Same author

Discovering Pair-wise Synergies in Microarray Data.

Scientific reports·2016
Same author

Three-Dimensional Rotation, Twist and Torsion Analyses Using Real-Time 3D Speckle Tracking Imaging: Feasibility, Reproducibility, and Normal Ranges in Pediatric Population.

PloS one·2016
Same author

Jigsaw puzzle metasurface for multiple functions: polarization conversion, anomalous reflection and diffusion.

Optics express·2016

Related Experiment Video

Updated: Jun 22, 2026

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
06:21

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Alignment for imprint lithography using nDSE and shallow molds.

Carl Picciotto1, Jun Gao, Zhaoning Yu

  • 1Hewlett Packard Labs, Palo Alto, CA 94304, USA. carl.picciotto@hp.com

Nanotechnology
|June 3, 2009
PubMed
Summary
This summary is machine-generated.

This study introduces a low-cost overlay alignment method for nanoimprint lithography using optical microscopy and specialized molds. The technique achieves 35 nm precision, saving silicon area and eliminating process variations.

More Related Videos

Micro-masonry for 3D Additive Micromanufacturing
08:45

Micro-masonry for 3D Additive Micromanufacturing

Published on: August 1, 2014

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
10:49

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

Published on: January 23, 2013

Related Experiment Videos

Last Updated: Jun 22, 2026

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
06:21

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Micro-masonry for 3D Additive Micromanufacturing
08:45

Micro-masonry for 3D Additive Micromanufacturing

Published on: August 1, 2014

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
10:49

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

Published on: January 23, 2013

Area of Science:

  • Materials Science
  • Nanotechnology
  • Metrology

Background:

  • Nanoimprint lithography requires precise overlay alignment for fabricating nanoscale devices.
  • Existing alignment methods can be costly, complex, and prone to process variations.

Purpose of the Study:

  • To develop a low-cost, high-precision overlay alignment metrology solution for nanoimprint lithography.
  • To eliminate process variations and save silicon area in the alignment process.

Main Methods:

  • Utilized optical microscopy and displacement-sensing algorithms.
  • Developed specially-designed imprint molds with shallow alignment marks.
  • Implemented nanoscale displacement sensing and estimation (nDSE) techniques.

Main Results:

  • Demonstrated nanoscale alignment with 35 nm precision (1-sigma).
  • Confirmed shallow alignment marks do not pattern the wafer.
  • Reduced measurement distances to near zero, optimizing displacement-sensing algorithms.

Conclusions:

  • The presented method offers a cost-effective and efficient solution for nanoimprint lithography overlay alignment.
  • Potential for achieving alignment errors down to the 1 nm range with further engineering.
  • Eliminates the need for inter-device mark comparison, reducing process variability.