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Interferometric amplitude apodization of integrated gratings
Optics Express
|June 5, 2009
Summary
Researchers developed a new method for controlling diffractive amplitude in photolithography. This technique allows for flexible programming of spectral and spatial functions in integrated optical devices.
Area of Science:
- Optics and Photonics
- Nanotechnology
- Integrated Optics
Background:
- Modern photolithography enables high-resolution diffractive structures for integrated optical devices.
- Amplitude apodization is crucial for programming spectral and spatial transfer functions in these devices.
Purpose of the Study:
- To present a novel approach for flexible binary-etch-compatible diffractive amplitude control.
- To enable precise programming of spectral and spatial transfer functions in integrated optical devices.
Main Methods:
- Decomposition of diffractive structures into subregions.
- Spatially positioning diffractive contours within subregions.
- Utilizing interferometric control of net diffractive amplitude and phase.
Main Results:
- Achieved flexible binary-etch-compatible diffractive amplitude control.
- Demonstrated substantial decoupling of amplitude and phase apodization.
- Enabled programming of general spectral and spatial transfer functions.
Conclusions:
- The described approach offers a powerful method for designing advanced diffractive optical elements.
- This technique facilitates the creation of sophisticated integrated spectral filters, multiplexers, and routers.
