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Related Experiment Video

Updated: Jun 22, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
09:18

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Imprinted silicon-based nanophotonics.

Peter I Borel, Brian Bilenberg, Lars H Frandsen

    Optics Express
    |June 18, 2009
    PubMed
    Summary
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    Nanoimprint lithography enables cost-efficient fabrication of silicon-on-insulator nanophotonic devices. This method achieves high-fidelity replication for complex photonic crystal waveguide structures.

    Area of Science:

    • Nanophotonics
    • Materials Science
    • Lithography

    Background:

    • Silicon-on-insulator (SOI) is a key platform for nanophotonic devices.
    • Advanced fabrication techniques are crucial for creating complex nanostructures.
    • Nanoimprint lithography offers a promising alternative to traditional methods.

    Purpose of the Study:

    • To demonstrate and optically characterize nanophotonic devices fabricated using nanoimprint lithography on SOI.
    • To realize both ordinary and topology-optimized photonic crystal waveguide structures.
    • To evaluate the capabilities of nanoimprint lithography for sub-30 nm feature definition.

    Main Methods:

    • Fabrication of silicon-on-insulator nanophotonic devices using nanoimprint lithography.
    • Creation of ordinary and topology-optimized photonic crystal waveguide structures.

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    Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
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    Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

    Published on: January 23, 2013

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    Last Updated: Jun 22, 2026

    Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
    09:18

    Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

    Published on: February 8, 2022

    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
    05:57

    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

    Published on: April 1, 2020

    Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
    10:49

    Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

    Published on: January 23, 2013

  • Optical characterization of the fabricated devices.
  • Achieving lateral pattern definition on a sub-30 nm scale and deep vertical silicon etch (~300 nm).

    • Main Results:

    • Successful fabrication of silicon-on-insulator based nanophotonic devices.
    • Demonstration of both ordinary and topology-optimized photonic crystal waveguide structures.
    • Nanoimprint lithography achieved high replication fidelity, comparable to electron beam lithography.
    • The method enabled precise definition of sub-30 nm features and deep etches.

    Conclusions:

    • Nanoimprint lithography is a viable and cost-efficient method for fabricating advanced nanophotonic devices on SOI.
    • The technique allows for the creation of complex structures with high precision.
    • This fabrication approach holds potential for scalable and high-fidelity nanophotonics manufacturing.