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65 nm feature sizes using visible wavelength 3-D multiphoton lithography
Optics Express
|June 18, 2009
Summary
Researchers created nanoscale features using femtosecond pulsed laser excitation. This advanced multiphoton lithography technique enables sub-diffraction limited fabrication for photonic crystals.
Area of Science:
- Materials Science
- Optics
- Nanotechnology
Background:
- Precise fabrication of nanoscale features is crucial for advanced optical devices.
- Multiphoton lithography offers high resolution for 3D microfabrication.
- Chromophore-initiated crosslinking is a key process in photopolymerization.
Purpose of the Study:
- To investigate the reproducible formation of nanoscale features using femtosecond pulsed laser excitation.
- To perform dosimetry studies on photoinduced polymerization initiated by a specific chromophore.
- To fabricate 3D polymeric photonic crystal structures and analyze their optical properties.
Main Methods:
- Utilized 520 nm femtosecond pulsed laser excitation of a 4,4'-bis(di-n-butylamino)biphenyl chromophore.
- Initiated crosslinking in a triacrylate blend to form nanoscale features.
- Conducted dosimetry studies and employed three-dimensional multiphoton lithography.
Main Results:
- Reproducibly formed nanoscale features as small as 65 +/- 5 nm.
- Achieved sub-diffraction limited line widths using two-photon absorption at 520 nm and 730 nm.
- Fabricated 3D polymeric woodpile photonic crystal structures with near-infrared stop bands.
Conclusions:
- Femtosecond pulsed laser excitation of the specified chromophore enables precise nanoscale fabrication.
- The 520 nm excitation yields smaller features compared to 730 nm.
- Fabricated photonic crystals demonstrate potential for near-infrared applications.
